Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template

ABSTRACT

A template  1  is brought close to or in contact with a surface to be patterned  111  and patterns are formed with liquid  62  on the surface  111 . This method comprises the steps of: bringing the template  1  close to or essentially in contact with the surface  111 , supplying liquid  62  to a plurality of through holes  12  established in the pattern transfer region  10  of the template  1  for supplying the liquid  62 , and separating the template  1  from the surface  111  after the liquid  62  is adhered to the surface  111  via the through holes  12.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a patterning technique forsemiconductor integrated circuits or the like, and more particularly toa new patterning method using both a template and a inkjet system.

2. Description of the Related Art

Photolithography is a general method for manufacturing integratedcircuits or the like on silicon substrates or glass substrates. To formpatterns using photolithography, a thin coat of photosensitive material,called resist, is applied on a silicon wafer and then the integratedcircuit pattern, prepared on a glass dry-template with photoengraving,is printed (transferred) with light. With the transferred resist patternas a mask, the material beneath the resist is etched to form wiringpatterns and elements. This photolithographic method requires processessuch as resist application, exposure, and development, making itimpossible to prepare fine patterns outside of a semiconductor plant orthe like having facilities such as large scale equipment, powerdistribution facilities, and exhaust facilities. For this reason, othermethods in a smaller scale for forming fine patterns have beenresearched.

For example, the method called MIMIC (micromolding in capillaries), forforming patterns using a mold, was disclosed in the Journal of theAmerican Chemical Society 1996, No. 118, pp. 5722-5731. In this method,a template, whereon μm-order grooved structures are formed of polymer,is placed on the substrate and liquid is caused by capillarity toinfiltrate from the grooved sides. The template is made ofpolydimethylsiloxane and the liquid is a polymer, solution of polymer,colloidal solution, or the like. After the reaction between the liquidand the substrate is complete, the template is removed to revealpatterns formed upon the substrate.

In the abovementioned MIMIC method, however, the distance to which theliquid can be supplied from the sides of the template is limited becausethe liquid is spread by capillarity. A consequent problem is that largepatterns cannot be formed using wide templates.

SUMMARY OF THE INVENTION

The present invention was made in view of the foregoing problem and, tothat end, provides a patterning method, with which it is possible topattern variously sized areas inexpensively and without large scalefacilities, a patterning apparatus with which such patterning ispossible, and a patterning template used in such patterning.

The inventors found that they could form fine patterns, without limitingthe template size, by using a template having through holes andsupplying the liquid in the necessary quantities for patterning throughthe holds in the template.

The patterning method relating to the present invention is a patterningmethod for forming patterns with liquid on the surface to be patterned(“pattern surface”) by placing a template close to or essentially incontact with the pattern surface. This patterning method comprises thesteps of placing the template close to or essentially in contact withthe pattern surface; supplying liquid to the through holes, a pluralityof which are established in the pattern transfer region of the templatein order for the supply of liquid; and removing the template from thepattern surface after the liquid passes through the through holes andadheres to the pattern surface.

In the abovementioned patterning method, the template may be a concavetemplate, convex template, or flat template. The surface of the templatemay be flat or curved. The pattern surface may be curved or flat. Inother words, the pattern surface may be made of a hard material such asa substrate or a flexible material such as film.

The liquid may be ink, or an organic material or inorganic material, solong as it has a viscosity allowing it to be supplied through thethrough holes. The liquid may also be a colloidal solution includingfine grains. For example, various colloidal solutions, such as thefollowing can be used: solution for forming black matrix comprisingcarbon powder dispersed in a solvent, solution for forming transparentelectrodes comprising transparent electrode material dissolved insolvent, and solution for forming electrode patterns comprising metalfine grains dispersed in a solvent.

The pattern transfer region may have either uniform patterning or beprepared with a specific pattern. When photolithography is used inpreparing the template, any pattern can be formed by adjusting theexposed region.

Each through hole in the template functions as a nozzle which suppliesliquid to the pattern surface. The location and number of through holesin the template is not limited so long as it is possible to supplyliquid to the pattern transfer region of the template. Through holediameters and numbers of through holes, whereby it is possible to supplysufficient liquid in a short period of time, may be provided. It ispreferable that the method for supplying liquid to the through holes bea method for applying pressure to the liquid, such as an inkjet system,because such method is fast and controllable. Also, natural liquidsupply, so as to supply liquid to the through holes by capillarity, canbe used. Capillarity and forced supply means such as an inkjet systemmay also be combined. Any material may be used as the template materialso long as it has the physical strength to sustain patterning and ischemically inert with respect to the liquid. It is especially preferredthat the template be constituted of a porous material or permeablematerial in order to naturally eliminate air after the liquid issupplied.

Below are concrete examples of the abovementioned patterning methodrelating to the present invention. In the abovementioned template, forexample, the through holes may be disposed along the patterning region.In that case, the step for supplying the liquid is a step wherein liquidis supplied by pressurizing all the through holes established in thetemplate.

Also, the through holes may be established uniformly in theabovementioned template. In that case, the step for supplying the liquidis a step wherein liquid is selectively supplied with an inkjet systemto only the through holes disposed in the pattern transfer region fromamong all the through holes established in the template.

Furthermore, the abovementioned template may be constituted of a porousmaterial. In the step where the template is separated from the patternsurface, the template is separated from the pattern surface after excessliquid supplied via the through holes is absorbed by the porousmaterial.

The patterning apparatus relating to the present invention is apatterning apparatus for placing a template near or essentially incontact with a pattern surface and forming patterns with liquid on thepattern surface. The patterning apparatus is provided a templatetransport mechanism for placing the template near or essentially incontact with the pattern surface; a liquid storage mechanism for storingthe liquid; a liquid supply mechanism for supplying the liquid from theliquid storage mechanism to the plurality of through holes establishedin the pattern transfer region of the template; and a control apparatusfor controlling the transport of the template by the template transportmechanism and the supply of liquid by the liquid supply mechanism.

In the abovementioned patterning apparatus, the control apparatus causesthe template to be placed near or essentially in contact with thepattern surface, liquid to be supplied via the through holes by theliquid supply mechanism, and the template to be removed from the patternsurface after the liquid adheres to the pattern surface.

The liquid storage mechanism is only required to store liquid by somemethod and, for example, comprises a tank for holding liquid and a pipeor the like through which liquid flows from the tank.

The template transport mechanism is a mechanism which can change therelative positions of the template and pattern surface; the templatetransport mechanism may transport the template, transport the substrateor the like having the pattern surface, or transport both.

The liquid supply mechanism may supply liquid by force using an inkjetsystem or the like; and may also have a constitution whereby the liquidis supplied naturally from the liquid reservoir using capillarity. Inthe case of an inkjet system, the liquid supply mechanism may have aconstitution wherein liquid can be expelled from inkjet recording headsat the desired locations on the template. In this case, the liquidsupply mechanism also includes a head transport structure constituted soas to vary the relative positions of the template and inkjet recordingheads.

For example, the abovementioned template has the through holes disposedalong the pattern transfer region and the liquid supply mechanism isprovided a pressure chamber for supplying liquid to all the throughholes in the template and a piezoelectric element which deforms at leastone wall surface of the pressure chamber and changes the volume of thepressure chamber.

For example, the abovementioned template has through holes disposeduniformly therein; the liquid supply mechanism is provided inkjetrecording heads constituted so as to expel the liquid and a headtransport mechanism for transporting the heads to certain through holesestablished in the template. The control apparatus causes the heads tomove and supply liquid to those through holes which are located in thepattern transfer region.

Furthermore, the abovementioned template is constituted of a porousmaterial and the control apparatus removes the template from the patternsurface after the excess liquid supplied via the through holes isabsorbed by the porous material.

The patterning template relating to the present invention is apatterning template for forming patterns by adhering liquid to a patternsurface. The pattern transfer region of the template is in the form of aconcave template and a plurality of through holes is established in thepattern transfer region.

The patterning template relating to the present invention is apatterning template for forming patterns by adhering liquid to a patternsurface. The pattern transfer region of the template is in the form of aconvex template and a plurality of through holes is established in thepattern transfer region.

Furthermore, the pattern transfer region of the template is in a formexhibiting an affinity for the liquid; the region other than the patterntransfer region (“the non-pattern transfer region”) is in a formexhibiting a non-affinity for the liquid; and a plurality of throughholes is established in the pattern transfer region.

Here, affinity and non-affinity are determined based on the propertiesof the liquid, which is used for the patterning. For example, if theliquid is hydrophilic, a hydrophilic composition exhibits affinity and ahydrophobic composition exhibits non-affinity. Oppositely, if the liquidis lipophilic, a hydrophilic composition exhibits non-affinity and ahydrophobic composition exhibits affinity. The liquid may be varied indifferent ways according to the industrial application.

For example, the abovementioned template is formed so that the patterntransfer region has the subject pattern. Also, the abovementionedtemplate may be formed in a standard pattern wherein the patterntransfer region is uniformly arranged. The abovementioned template maybe formed of porous material. Furthermore, the inner walls of thethrough holes formed in the abovementioned template may be formed so asto exhibit non-affinity for the liquid.

The method for manufacturing the patterning template relating to thepresent invention is a method for manufacturing a patterning templatefor forming patterns by adhering liquid to a pattern surface, comprisingthe steps of: forming a resist layer on the base; exposing portions ofthe resist layer according to a pattern; developing the exposed resistlayer; etching the base with the developed resist as an anti-etchingmask; coating the etched base with porous material; curing the porousmaterial applied; separating the cured porous material from the base;and forming a plurality of through holes in the pattern transfer regionof the separated porous material to form the template.

In the abovementioned method for manufacturing the patterning template,exposure may mean forming a mask in the resist layer and irradiating itwith light or exposing the resist to the prescribed pattern using alaser beam pickup with positional selectivity. The resist layer may bepositive type or negative type. The type of resist layer and exposureregion are determined according to whether the template is a concave orconvex template.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a plane view showing the structure of the template used in thefirst embodiment of the present invention;

FIG. 2 is a cross sectional view taken at line A-A in FIG. 1 showing thestructure of the template used in the first embodiment of the presentinvention;

FIG. 3 is a diagram showing the entire structure of the patterningapparatus in the first embodiment of the present invention;

FIG. 4 is a cross sectional view showing the combined structure of thepressure chamber panel and template in the first embodiment of thepresent invention;

FIG. 5 is a cross sectional view showing the patterning method of thefirst embodiment of the present invention;

FIG. 6 is a plane view showing patterning transferred by the template inthe first embodiment of the present invention;

FIG. 7 A-F are cross sectional views showing the steps in the method formanufacturing the template in the first embodiment of the presentinvention;

FIG. 8 is a plane view showing the structure of the template used in thesecond embodiment of the present invention;

FIG. 9 is a cross sectional view taken at line A-A in FIG. 8 showing thestructure of the template used in the second embodiment of the presentinvention;

FIG. 10 is a cross sectional view for explaining the patterning methodof the second embodiment of the present invention;

FIG. 11 is a diagram showing the entire structure of the patterningapparatus of the third embodiment of the present invention;

FIG. 12 is a partial cross sectional view showing the structure of theprincipal elements of the inkjet recording heads;

FIG. 13 is a diagram to explain the transport path of the inkjetrecording heads; and

FIG. 14 is a plane diagram showing the patterning on the substrateformed with the patterning method of the third embodiment of the presentinvention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

The preferred embodiments of the present invention are explained belowwith reference to the figures.

FIRST EMBODIMENT

The method for forming a black matrix (shaded pattern) such as is usedin a color filter, or the like, for a liquid crystal panel using aconcave template is explained as the first embodiment of the presentinvention.

FIG. 1 is a plane view of the pattern transfer surface of the templateused in the present embodiment. FIG. 2 is a cross sectional view showingthe structure of this template along line A-A (cut surface) in FIG. 1.

As shown in FIGS. 1 and 2, the template 1 of the present embodiment hasa structure wherein the pattern transfer region 10 is formed as concaveportions in the pattern transfer surface (bottom in FIG. 2) of theoriginal template 100. A plurality of through holes 12, passing throughto the back surface (top in FIG. 2) of the original template 100, isformed in the pattern transfer region 10. The inner walls of the throughholes 12 are preferably finished or treated so as to exhibitnon-affinity for the liquid. If treated for non-affinity, liquid iseliminated from within the through holes 12 when liquid is not beingsupplied and the drops of liquid are securely cut off. The region whereconcave areas are not formed, specifically the convex areas, comprisethe non-pattern transfer region 11. The pattern transfer region 10 isformed according to the pattern of a black matrix formed in the colorfilter of a liquid crystal panel.

A porous material is preferably used as the material forming thetemplate 1. When liquid is supplied from the through holes with thetemplate 1 being placed essentially in contact with the surface to whichthe pattern is transferred, air in the recessed portions correspondingto the pattern transfer region 10 escapes into the porous material andthis causes the liquid to fill into every portion of the patterntransfer region 10. Therefore, using a porous material prevents voidsfrom remaining in the concave portions. Polydimethylsiloxane, forexample, is used as the porous material.

The thickness of the pattern transfer region 10 of the template 1 isadjusted so that the volume of the recessed portions formed by thedifference in level with the non-pattern transfer region 11 suffices forthe amount of liquid necessary for patterning. The liquid supplied inthe small-diameter through holes 12 undergoes an extreme reduction involume due to the evaporation of much of the solvent component.Consequently, the thickness of the pattern transfer region 10 must besufficient to contain the amount of liquid in consideration of thisvolume reduction. Meanwhile, the non-pattern transfer region 11 of thetemplate 1 has a thickness such that the template is provided sufficientphysical strength; this thickness is adjusted so as to prevent theincrease in passage resistance caused by the increasing lengths of thethrough holes 12.

FIG. 3 shows the overall structure of the patterning apparatus in thepresent embodiment. As shown in FIG. 3, the patterning apparatus 200 inthe present embodiment comprises a template 1 having the structure shownin FIGS. 1 and 2, a pressure chamber panel 2, a piezoelectric element 3,a template transport mechanism 4, control apparatus 5, and liquidstorage mechanism 6.

The pressure chamber panel 2 is in contact with the template 1 and has astructure allowing it to supply liquid to the back surface of thetemplate 1. Specifically, the actual structure is as shown in the crosssectional view in FIG. 4. The pressure chamber panel 2 includes sidewalls 22 in contact with the edge portions of the back surface of thetemplate 1; an oscillating panel 23 is established on one surfacethereof. The pressure chamber 21 is formed by the back surface of thetemplate 1, side walls 22, and oscillating panel 23; the liquid 62 isstored therein via an ink tank aperture 24 established in theoscillating panel 23. The pressure chamber panel 2 has a fine structuremanufactured by etching silicon, glass, or quartz, for example. Theoscillating panel 23 is formed, for example, of heat oxide film. Thepiezoelectric element 3 is formed on the oscillating panel 23 at aposition corresponding to the pressure chamber 21. The ink tank aperture24 discussed above is established in the oscillating panel 23. Theliquid to form the desired pattern is supplied to the pressure chamber21 from the tank 60 via a pipe 61 by the liquid storage mechanism 6discussed below. Moreover, a colloidal solution of carbon powderdissolved in solvent, for example, is used as the liquid in the presentembodiment.

The piezoelectric element 3 comprises a piezoelectric thin film 31 heldbetween a lower electrode 30 and an upper electrode 32, as shown in FIG.4. The lower electrode 30 and upper electrode 32 are formed with astable, conductive material such as platinum. The piezoelectric thinfilm 31 is formed of a material with an electromechanical transducingaction and is constituted with a crystalline structure of aferroelectric material such as PZT (lead zirconate titanate). Thepiezoelectric element 3 is constituted so as to effect changes in volumecorresponding to the discharge signal Sp supplied from the controlapparatus 5.

Moreover, the abovementioned pressure chamber panel is constituted sothat volume changes are effected with the piezoelectric element, thevolume within the pressure chamber is changed, and liquid is expelled.The pressure chamber panel may also have a structure wherein the liquidis heated with a heating element and drops thereof are expelled due toits expansion. Also, as discussed above, the liquid 62 within thepressure chamber 21 may be naturally guided into the pattern transferregion 10 by capillarity due to the material forming the pressurechamber panel 2 and template 1 and the form and dimensions of thethrough holes 12.

Moreover, one each of the pressure chamber 21 and piezoelectric element3 is shown in each figure in order for simplicity in this explanation,but a plurality of pressure chambers may be established in prescribedregions and a plurality of piezoelectric elements 3 may be establishedcorresponding thereto.

The template transport mechanism 4 comprises a mechanical structure witha motor 40 and other elements, not shown. The motor 40 is constituted soas to be driven according to a drive signal Sm from the controlapparatus 5. The power of the motor 40 is constituted so as to be ableto transport the template 1 and pressure chamber panel 2 upwards anddownwards, in the figure. Moreover, it is sufficient that the templatetransport mechanism 4 be a constitution so as to change the positions ofthe template 1 and pressure chamber panel 2 relative to the substrate110. For this reason, constitutions other than the abovementionedconstitution may be used so that the substrate 110 moves relative to thetemplate 1 and so forth, or both the template 1 and so forth andsubstrate 110 move.

The control apparatus 5 is provided the functions of a computerapparatus or sequencer and is constituted so that the patterning methodof the present invention is carried out by the patterning apparatus. Theapparatus outputs the drive signal Sm to the motor 40 of the templatetransport mechanism 4 and and is able to change the distance between thetemplate and pattern surface 111 at the desired timing. This apparatusis constituted to supply a discharge signal Sp to the piezoelectricelement 3, so that the liquid 62 is supplied to the template 1 from thepressure chamber panel 2 at the desired timing.

The liquid storage mechanism 6 comprises a tank 60 and pipe 61. The tank60 holds the liquid for forming patterns; the pipe 61 is formed tosupply the liquid stored in the tank 60 to the ink tank aperture 24 inthe pressure chamber panel 2.

Patterning Method

Next, the patterning method using the abovementioned patterningapparatus 200 is explained with reference to FIGS. 4 and 5.

In the state as shown in FIG. 4 wherein the discharge signal Sp is notapplied to the piezoelectric element 3, the liquid 62 fills the pressurechamber 21 of the pressure chamber panel 2. Due to the high surfacetension of the liquid, the liquid does not flow into the through holes12 in this state. The substrate 110 subject to patterning is positionedwithin a range in which the template 1 can be transported by thetemplate transport mechanism 4.

Next the control apparatus 5 transports the template 1 and pressurechamber panel 2 toward the substrate 110 and places the pattern transfersurface of the template 1 in contact with the pattern surface 111 of thesubstrate 110 as shown in FIG. 5.

Then the control apparatus 5 supplies the discharge signal Sp to thepiezoelectric element 3. The application of voltage causes the volume ofthe piezoelectric element 3 to change, deforming the oscillating panel23. As a result, the oscillating panel 23 deforms from the position P1shown with the dotted line to the flexed position P2, as shown in FIG.5. When the oscillating panel 23 deforms, the pressure on the liquid inthe pressure chamber 21 increases and the liquid moves from the throughholes 12 into the recessed portions of the pattern transfer region 10.When the liquid enters the recessed portions, a corresponding volume ofair must escape. Although the recessed portions are surrounded on foursides by the template 1 and substrate 110, the template 1 is formed ofporous material as discussed above. Thus, a volume of air correspondingto the liquid entering the recessed portions is expelled via the wallportions of the template 1. For this reason, the liquid can fill everypart of the recessed portions of the pattern transfer region 10 withoutair remaining in the recessed portions.

When the liquid contacts the substrate 110, the control apparatus 5supplies the drive signal Sm to the template transport mechanism 4 whileproviding the discharge signal Sp to the piezoelectric element 3. Thetemplate 1 is lifted along with the pressure chamber panel 2 and anappropriate amount of liquid is transferred according to the form of thepattern transfer region 10 of the template 1. If heat treatment,chemical treatment, or the like is performed on the substrate 110 andthe solvent component of the liquid transferred to the substrate 110 isevaporated, then the carbon grains in the liquid are fixed on thesubstrate 110. With these processes, a black matrix 112 is formed asshown in FIG. 6 and has the form of the pattern transfer region 10 shownin FIG. 1 transferred without alterations to the pattern surface 111 ofthe substrate 110.

In the case of a structure where the liquid 62 in the pressure chamber21 is naturally guided by capillarity into the recessed portions of thepattern transfer region 10, the control apparatus 5 need only controlthe upwards and downwards movement of the template 1. In thisconstitution, the recessed portions in a state of being continuallyfilled with the liquid 62; as a result, a pattern of liquid is left onthe pattern surface 111 when the template 1 is placed in contact withthe substrate 110 and then removed.

Method for Manufacturing the Template

Next, the method for manufacturing the template 1 is explained withreference to FIG. 7. FIGS. 7A-F are cross sectional views showing eachmanufacturing process.

Forming the Resist Layer (FIG. 7B)

The resist layer coating process is a process for forming a resist layeron the pattern transfer surface of the base template 100. First, theabovementioned porous material is molded and formed into the basetemplate (FIG. 7A). Next a resist layer 101 is formed on one surface ofthe base template 100. The resist material may be positive or negative.With a negative resist, the exposed portions become insoluble in thedeveloping solution and remain. With a positive resist, the unexposedportions become insoluble in the developing solution and remain. Theresist is applied to a uniform thickness using methods such as a spinnermethod, spray method, or the like and forms the resist layer 101.

Exposure (FIG. 7C)

The exposure process exposes the resist layer 101 according to the typeof the resist in the prescribed pattern. In other words, when using apositive resist as the material for the resist layer 101, thenon-pattern transfer region 11 is irradiated with light 102. When usinga negative resist, the pattern transfer region 10 is irradiated withlight 102. A usual resist material, such as the novolak type or chemicalamplifier type, is used as the resist material. An energy beam using aknown light source such as a UV lamp or excimer laser is used as thelight 102.

Developing (FIG. 7D)

The developing process develops the exposed resist layer and leaves onlythose portions of the resist layer corresponding to the non-patterntransfer region (region 11 in FIG. 2). A known developing solution, suchas the following, is used in the developing process: alkali solutionssuch as tetramethyl ammonium hydroxide, potassium hydroxide, sodiumhydroxide, or calcium hydroxide, or organic solvents such as xylene.

Etching (FIG. 7E)

In the etching process, the side of the base template material 100having the developed resist layer 101 is etched with the resist layer asa mask to form the concave portions corresponding to the patterntransfer region 10. The etching method maybe wet anisotropic etching oranisotropic etching using an active gas, such as plane-parallel reactiveion etching. This etching preferably has high selectivity andselectively etches only the porous material. The etching depth isadjusted appropriately according to the amount of liquid necessary forthe pattern, as discussed above. The etching depth may extend to asubstantially central portion of the base height or thickness. Afteretching, the remaining resist layer 101, which was used as anetch-resistant mask, is removed with solvent or the like.

Through Hole Formation (FIG. 7F)

The process for forming through holes opens a plurality of through holes12 in the etched base template 100. Methods such as laser finishing orpunching are used to form the through holes 12. The number of throughholes 124 is the number which can supply sufficient liquid to therecessed portions. In the case where the porous material of the templateis a material which does not exhibit non-affinity for the liquid, it ispreferable that the inner walls of the through holes 12 be finished ortreated so as to exhibit non-affinity for the liquid. Methods offinishing the surface so as to exhibit non-affinity for the liquid arediscussed below in section concerning other variations.

A template can be manufactured in the following manner by arranging themethod shown in FIG. 7. Foremost, by using a flat plate constituted of aporous material or other materials as the base plate 100, a patternhaving a concave and convex surface is formed on the base plate 100 bysteps A through E. Subsequently, a porous material is applied on thisetched base plate to form a layer constituted of a porous material, andthe pattern of this base plate is transferred to such porous-materiallayer. Thereafter, the porous-material layer with the aforementionedpattern transferred thereon is removed from the base plate 100, andthrough holes are formed on the porous-material layer in a mannerexplained in FIG. 7F, whereby a patterning template (the removedporous-material layer) is obtained.

According to the first embodiment, the template has a structure with aconcave form and has through holes passing through the concave portions;this is a template whereby a large pattern is formed as a unit.Therefore, patterning can be done inexpensively and without using largescale facilities. With this template, liquid can be supplied directly tothe pattern transfer region from through holes on the back side of thetemplate; patterns can therefore be formed over a broader area than ispossible with the abovementioned MIMIC method. Consequently, this is anappropriate method for creating patterns such as black matrixes,transparent electrodes, regular electrodes, and so forth for largeliquid crystal panels.

SECOND EMBODIMENT

Next, a method for using a convex template to form a black matrix(shaded pattern) used in a color filter, or the like, of a liquidcrystal panel is explained as the second embodiment of the presentinvention.

FIG. 8 shows a plane view of the pattern transfer surface of thetemplate used in the present embodiment. FIG. 9 is a cross sectionalview showing the structure of the template along the line A-A (cutsurface) in FIG. 8.

As shown in FIGS. 8 and 9, the template 1 b in the present embodimenthas the pattern transfer region 10 b in a convex form on the patterntransfer surface of the base template 100. In other words, the planarstructure of the pattern transfer surface in FIG. 8 is the same as inFIG. 1, but the pattern transfer region 10 b corresponds to the convexportion of the template.

A plurality of through holes 12 b passing to the back surface of thebase template 100 are formed in the pattern transfer region 10 b. Thethrough holes 12 b are preferably finished so as to have non-affinityfor the liquid, as in the first embodiment above. The regions on thebase template 100 where protrusions are not formed constitute thenon-pattern transfer region 11 b. The material and thickness of thetemplate 1 b can be the same as those in the first embodiment discussedabove. The template 1 b in the present embodiment is installed on apatterning apparatus 200, with the structure shown in FIG. 3 andexplained in the abovementioned first embodiment, and used inconjunction with the pressure chamber panel as shown in FIGS. 3 and 4.

Patterning Method

The patterning method in the present embodiment is essentially the sameas that in the abovementioned first embodiment. As shown in FIG. 10, thetemplate 1 b, joined with the pressure chamber panel with the liquid 62filling the pressure chamber (not shown), is moved in the direction ofthe substrate 110 until a slight gap is formed between the patterntransfer region 10 b and pattern surface 111. Capillarity occurs in thisgap and causes,the liquid 62 supplied via the through holes 12 b toentirely fill the pattern transfer region 10 b. Upon moving the template1, the control apparatus 5 supplies the liquid 62 via the pressurechamber. The liquid 62 is supplied onto the substrate 110 from thethrough holes 12 b and forms drops 63. After the drops 63 of liquidsufficiently attach to the surface of the substrate 110 and chemicallyreact with the surface, the template 1 b is separated from the substrate110. A pattern is formed on the substrate 110 with this procedure. Whencarbon powder dissolved in solvent is used as the liquid and the patterntransfer region 10 b has a lattice form as in FIG. 8, a black matrix fora color filter used in a liquid crystal panel is formed on the substrate110 with the abovementioned procedure.

Moreover, the method for manufacturing the template 1 b in the presentembodiment may be based on the method for manufacturing the template inthe abovementioned first embodiment. It is necessary to make appropriateadjustments such as reversing the resist material to positive ornegative or reversing the exposed region and unexposed region.

With the second embodiment discussed above, the same effects as with thefirst embodiment can be attained even with the convex type of patterningtemplate.

THIRD EMBODIMENT

Next, a patterning apparatus which can create the desired patterns usinginkjet recording heads is explained as the third embodiment of thepresent invention.

FIG. 11 shows the constitution of the patterning apparatus of thepresent embodiment. As shown in FIG. 11, the patterning apparatus 200 bof the present embodiment comprises a template 1, inkjet recording heads2 b, a template transport mechanism 4 b, control apparatus 5 b, liquidstorage mechanism 6 b, and a head transport mechanism 7.

The template 1 (see FIGS. 1 and 2) used in the first embodiment can beused without any alterations as the template 1 in this embodiment. It isalso possible to use the template 1 b used in the second embodiment.Since the present embodiment in particular has a constitution whereinthe desired pattern can be formed by transporting the inkjet recordingheads, the template may have a lattice pattern or uniform pattern ofdots at uniform intervals. The pattern transfer region 10 andnon-pattern transfer region 11 (see FIG. 2), in the case of the template1, and the pattern transfer region 10 b and non-pattern transfer region11 b (see FIG. 10), in the case of the template 1 b, are combinedaccording to a certain convention. The liquid can be supplied to thedesired pattern transfer region 10 or 10 b by selecting whether tosupply liquid from the through holes 12 or 12 b.

The inkjet recording heads 2 b have the structure as shown in FIG. 12.An oscillating panel 23, with a piezoelectric element 3 thereon, isestablished on one surface of the pressure chamber panel 20. A nozzlepanel 29, having nozzles 28 thereon, is laminated on the other surfaceof the pressure chamber panel 20. A pressure chamber (cavity) 21,reservoir 25, supply aperture 26, and so forth are formed on thepressure chamber panel 20 by etching silicon, glass, or quartz, forexample. The pressure chamber 21 is partitioned with side walls 22. Theoscillating panel 23 and piezoelectric element 3 have the same structureas used in the pressure chamber panel 2 in the abovementioned firstembodiment. The nozzles 28 established in the nozzle panel 29 areestablished at positions corresponding to the pressure chamber 21. Withthe abovementioned constitution, the inkjet recording heads 2 b arestructured so that each pressure chamber 21 is filled via supplyapertures 26 with liquid 62, supplied from the liquid storage mechanism6 and introduced to the reservoir 25 via the ink tank aperture 24. Whenvoltage is applied to the piezoelectric element 3, the volume of thecorresponding pressure chamber 21 changes and drops 63 of liquid aredischarged from the nozzle 28 corresponding to that pressure chamber.

Moreover, the abovementioned pressure chamber panel is constituted sothat its volume is changed by the piezoelectric element 3 and liquid isdischarged. It may also be constituted so that the liquid is heated by aheating element and drops are discharged due to the thermal expansionthereof.

The template transport mechanism 4 b is provided the same type ofstructure as the template transport mechanism 4 (see FIG. 3) used in theabovementioned first embodiment. In the present embodiment, however, thetemplate transport mechanism is constituted so that only the template 1can be moved. This is because the inkjet recording heads 2 b aretransported independently from the template 1 by the head transportmechanism 7.

The liquid storage mechanism 6 b comprises a tank 60 and pipe 61. Thetank 60 holds the liquid relating to the present invention; the pipe 61supplies the liquid stored in the tank 60 to the ink tank aperture 24 ofthe inkjet recording heads 2 b.

The head transport mechanism 7 comprises motors 71 and 72 and othermechanical structures, not shown. The motor 71 is constituted totransport the inkjet recording heads 2 b in the direction of the X axisaccording to the signal Sx from the control apparatus 5 b to move in thedirection of the X axis. The motor 72 is constituted to transport theinkjet recording heads 2 b in the direction of the Y axis according tothe signal Sy from the control apparatus 5 b to move in the direction ofthe Y axis. Moreover, the template transport mechanism 7 may be provideda constitution so as to change the position of the inkjet recordingheads 2 b relative to the template 1. For this reason, other acceptablestructures include the template 1 and substrate 110 moving in relationto the inkjet recording heads 2 b, or the inkjet recording heads 2 b,template 1, and substrate 110 all moving.

The control apparatus 5 b is provided the functions of a computerapparatus or sequencer and is constituted so that the patterning methodof the present invention is carried out by the patterning apparatus. Theapparatus outputs the drive signal Sm to the template transportmechanism 4 b and is able to change the distance between the templateand pattern surface 111 at the desired timing. This apparatus isconstituted to supply a discharge signal Sp to the piezoelectric element3, so that drops 63 of liquid are supplied to the template 1 from inkjetrecording heads 2 b at the desired timing. Furthermore, the headtransport mechanism 7 is provided a constitution so as to be able totransport the inkjet recording heads 2 b to a desired position relativeto the template 1 when supplied the X axis driving signal Sx and Y axisdriving signal Sy.

Patterning Method

The patterning method using the abovementioned patterning apparatus 200b and the template 1 with the structure shown in FIGS. 1 and 2, or thetemplate 1 b with the structure shown in FIGS. 8 and 9, as the templateis explained next. The control apparatus 5 b transports the template 1(1 b) toward the substrate 110 and places the pattern transfer surfaceof the template 1 (1 b) in contact with the pattern surface 111 of thesubstrate 110. Moreover, when the relief template 1 b from the secondembodiment is used, these are brought close together with a slight gapleft therebetween.

The control apparatus 5 b then supplies the X axis driving signal Sx andY axis driving signal Sy to the head transport mechanism 7. The inkjetrecording heads 2 b is moved according to the driving signals over thetemplate in the patterning route, established in advance, as shown withthe arrow in FIG. 13. While transporting the inkjet recording heads 2 b,the control apparatus 5 b supplies the discharge signal Sp to the inkjetrecording heads 2 b at the positions where the through holes 12 (12 b)are established on the pattern transfer region 10 (10 b). Drops 63 ofliquid are discharged from the inkjet recording heads 2 b into thethrough holes 12 (12 b) on the patterning route of the template 1 (1 b).Because of the effects of capillarity in the through holes 12 (12 b)impacted by the drops 63 of liquid, the liquid 62 moves through thethrough holes 12 (12 b) and reaches the pattern transfer surface of thetemplate 1 (1 b). When using the template 1 from the first embodiment,the pattern transfer surface of the template 1 has an intaglio form andthe transfer surface is placed essentially in contact with the patternsurface of the substrate 110. When using the template 1 b from thesecond embodiment, the pattern transfer surface of the template 1 b hasa relief form and the transfer surface is placed near the patternsurface 111 of the substrate 110 with a small gap therebetween. Theliquid 62 adheres on the substrate 110 in the pattern according to thetransport route of the inkjet recording heads 2 b. If this substrate 110undergoes post-processing such as heat treatment, the pattern 112 ofliquid can be formed on the pattern surface 111 of the substrate 110 asshown in FIG. 14.

As discussed above, the present embodiment has a constitution wherebythe template and inkjet recording heads can be moved relative to eachother. Therefore any pattern can be formed without the template beingformed according to a specific pattern. In particular, the applicationof this technology can provide a moderately priced, householdprinter-sized manufacturing apparatus which can form any pattern becauseof the mass production of inkjet recording heads, which are small andinexpensive.

Other Variations

The present invention may also be applied to variations which aredifferent from the abovementioned embodiments. For example, the form ofthe pattern transfer region established on the template disclosed in theabovementioned embodiments is merely an example; various changes notnoted in the embodiments may be made. Identical patterns, as in FIG. 1and so forth, may be established uniformly and regularly. However, it isalso acceptable to form the pattern transfer region on the templateaccording to a pattern to be established on the substrate. This type ofstructure makes it possible to form complex patterns as a unit.

Aspects of the template other than patterning may be modified in waysnot noted in the abovementioned embodiments. In the abovementionedembodiments, for example, the patterning template was an concavetemplate or a convex template, but it may also be a flat template.

When the patterning template is a flat template, the pattern transferregion of the template undergoes surface treatment so as to be anaffinity region with affinity for the liquid and the non-patterntransfer region undergoes surface treatment so as to be a non-affinityregion without affinity for the liquid. Provision of affinity ornon-affinity to the surface of the template can be realized by selectinga method appropriate for the material used for the template.

For example, it is possible to use a method of forming self-assemblingmonomolecular films of sulfur compounds. In this method, a metal layerof gold or the like is established on the surface of the template; thetemplate is soaked in a solution including sulfur compounds andself-assembling monomolecular films are formed. It is possible toprovide affinity or non-affinity for the liquid depending on thecomposition of the sulfur compounds. Consider the template 1 with thesectional structure shown in FIG. 2 as an example. When the template 1itself is made of a porous material exhibiting non-affinity for theliquid, a gold layer is established thereon and the gold in the regioncorresponding to the non-pattern transfer region 11 is evaporated andremoved with a laser beam or the like. Soaking the template in sulfurcompounds afterwards causes sulfur compounds exhibiting affinity for theliquid to self-assemble thereon. The region where the self-assembledfilm of sulfur compounds forms becomes the pattern transfer region 10;the region where the self-assembled film does not form becomes thenon-pattern transfer region 11.

The same type of flat template can be produced by selectively adheringorganic material such as paraffin on the template. Consider the template1 with the sectional structure shown in FIG. 2 as an example. First, thetemplate is manufactured of porous material exhibiting affinity for theliquid. The template is then coated with paraffin and the paraffin ismasked in the form of the pattern transfer region 10. The paraffin isevaporated with the energy from a laser beam; the region from which theparaffin was removed becomes the pattern transfer region 10 and theregion where paraffin remains becomes the non-pattern transfer region11.

The same type of flat template can be manufactured with selective plasmatreatment. The region irradiated with plasma has a large number ofunreacted radicals and a crosslinked layer in the surface layer of thetemplate material. This is exposed to the air or to an oxygen atmosphereand the unreacted radicals are oxidized to form carbonyl radicals andhydroxyl radicals. Because they are polarized, these radicals haveaffinity. Meanwhile most glass or plastic has non-affinity.Consequently, regions with affinity and regions with non-affinity can beproduced with partial plasma treatment. Because the liquid is classifiedas to whether it has affinity for water (hydrophilicity), it is possibleto produce a flat template relating to the present invention with theabovementioned method by further selecting the material of which theliquid is made. Furthermore, it is possible to manufacture a flattemplate wherein the regions exhibiting affinity for the liquid aremixed with the regions exhibiting non-affinity by using a method ofproviding an electric charge to the template surface.

Also, it is possible to attain a template used in the present inventionby forming films exhibiting non-affinity (affinity) on a templateshowing affinity (non-affinity). This may be accomplished with varioustypes of printing methods.

According to the present invention, patterning can be carried outinexpensively and without large scale facilities by using a patterningmethod which is provided a process for forming patterns using a templatewherein through holes are established. In particular, the necessaryquantity of liquid can be supplied regardless of the size of thetemplate because it is possible to supply liquid directly from throughholes to the pattern transfer region. Furthermore, since the templatecan be used as a master any number of times, the low depreciation costscan reduce the manufacturing costs of patterning.

According to the present invention, patterning can be carried outinexpensively and without large scale facilities by using a patterningapparatus which is provided a constitution wherein patterning ispossible using a template wherein through holes are established. Inparticular, the necessary quantity of liquid can be supplied regardlessof the size of the template because it is possible to supply liquiddirectly from through holes to the pattern transfer region.

According to the present invention, patterning can be carried outinexpensively and without large scale facilities by using a patterningtemplate wherein through holes are established. In particular, thenecessary quantity of liquid can be supplied regardless of the size ofthe template because it is possible to supply liquid directly fromthrough holes to the pattern transfer region.

According to the present invention, patterning can be carried outinexpensively and without large scale facilities with the method formanufacturing a template wherein through holes are established. Inparticular, the necessary quantity of liquid can be supplied regardlessof the size of the template because it is possible to supply liquiddirectly from through holes to the pattern transfer region.

By using a colloidal solution wherein carbon powder is dispersed as theliquid, for example, with the present invention, a black matrix for acolor filter can be formed on the substrate by evaporating the solventportion of the solution. By using a solution of dissolved transparentelectrode material as the liquid, a transparent electrode film can beformed by heat treatment after patterning. By using a colloidal solutionwherein metal particles are dispersed as the liquid, a conductive,patterned metal film can be formed by heat treatment after patterning.

The entire disclosure of Japanese Patent Application No. H10-144892filed on May 26, 1998 including specification, claims, drawings andsummary are incorporated herein by reference in its entirety.

1. A method for manufacturing a pattern template, the template beingused to form patterns with a liquid adhered to a surface, the methodcomprising the steps of: forming a resist layer on a base constituted ofa porous material; exposing portions of said resist layer according to apattern; developing said exposed resist layer; etching the base whereonsaid developed resist layer is established, with the resist layer as amask, to form a portion corresponding to a pattern transfer region,wherein the etching is performed through less than an entire thicknessof the base; forming a plurality of through holes in the portion to forma template; and finishing the surface of the pattern transfer region soas to exhibit affinity for a liquid transmitted through the template. 2.A method for manufacturing a patterning template, the template beingused to form patterns with a liquid adhered to a surface, the methodcomprising the steps of: forming a resist layer on a base constituted ofa porous material; exposing portions of said resist layer according to apattern; developing said exposed resist layer; etching the base whereonsaid developed resist layer is established, with the resist layer as amask, to form a portion corresponding to a pattern transfer region,wherein the etching is performed through less than an entire thicknessof the base; forming a plurality of through holes in the portion to forma template; and finishing the surface of the non-pattern transfer regionso as to exhibit non-affinity for a liquid transmitted through thetemplate.
 3. A method for manufacturing a patterning template, thetemplate being used to form patterns with a liquid adhered to a surface,the method comprising the steps of: forming a resist layer on a baseconstituted of a porous material; exposing portions of said resist layeraccording to a pattern; developing said exposed resist layer; etchingthe base whereon said developed resist layer is established, with theresist layer as a mask, to form a portion corresponding to a patterntransfer region, wherein the etching is performed through less than anentire thickness of the base; forming a plurality of through holes inthe portion to form a template; and finishing the inner walls of thethrough holes so as to exhibit non-affinity for a liquid transmittedthrough the through holes of the template.